Parametric study of refractory metal films by laser-induced deposition

J. Xu; X. M. Lu; Q. H. Lou

doi:10.1364/OAM.1990.TuY10

Optical Society of America Annual Meeting
Technical Digest Series (Optica Publishing Group, 1990),
paper TuY10
•https://doi.org/10.1364/OAM.1990.TuY10

Parametric study of refractory metal films by laser-induced deposition

J. Xu, X. M. Lu, and Q. H. Lou

OSA Annual Meeting 1990

Boston, Massachusetts United States
4–9 November 1990
ISBN:

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Poster Session: 1 (TuY)

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J. Xu, X. M. Lu, and Q. H. Lou, "Parametric study of refractory metal films by laser-induced deposition," in Optical Society of America Annual Meeting, Technical Digest Series (Optica Publishing Group, 1990), paper TuY10.

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Abstract

Thin films of W and Mn on quartz and Pyrex substrates were deposited by photodissociation of respective carbonyls W(CO)6 and Mn2(CO)10 with a XeCl laser at 308 nm. The UV laser beam at 10 Hz was focused into a Pyrex cell containing carbonyl gas and was perpendicularly incident on a quartz or Pyrex substrate.

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