Abstract

MetaMode™ is a tradename for a special form of metal-mode reactive sputtering. It is a practical and scaleable sputtering process in which the metal-deposition zone is separated from the subsequent reactive (typically oxidation) zone. Other investigators, including Schiller¹,² and Hartsough³ have suggested similar ideas. However, the MetaMode process has demonstrated the capability to make optical-quality dielectric films at metal-sputtering rates. A typical laboratory setup for this process includes a 30-in.-diameter drum, usually rotating from 50 to 150 rpm, on which the substrate is mounted. The sputter target is a 20-in. de magnetron. A similar-sized linear ion gun of OCLI design provides the reactive species. The sputtering and reaction regions are well isolated from each other with baffles and extensive vacuum pumping. In this paper we present MetaMode-deposited TiO₂ film results for a variety of deposition parameters. Both the optical (n and k) and physical properties of these films were measured. The density and stoichiometry were obtained from RBS measurements and the structure information from TEM experiments. For comparison, results from titania films made with dual-ion-beam sputtering and ion-assisted evaporation will also be shown.

© 1990 Optical Society of America