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Applications for sputtered dielectrics

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Abstract

The introduction of the C-MAG™ cathode has opened up the possibility of SiO2 and TiO2 film deposition by reactive sputtering. These materials have indices of refraction that are lower and higher than the index of glass respectively. The availability of these dielectric materials make some new applications feasible. The integrated reflection of metal mirrors can be enhanced in the visible by the use of a thin-film optics design based on the use of dielectric materials. We have investigated the design considerations of first and second surface mirror enhancement for aluminum and chromium mirrors, using single-layer, double-layer, and quadruple-layer designs. The use of both SiO2 and TiO2 have been considered in the designs. In addition to the enhancement of reflection one can reduce the reflection by suitable choices of the optical thicknesses of the layers in the thin- film design. Anti-reflection coatings for glass have been designed and produced using the new capability to sputter SiO2 and TiO2. A two-layer design and a four-layer design have been explored. The infrared characteristics of the visible light antireflection coatings will also be discussed.

© 1990 Optical Society of America

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