Abstract

Fabrication errors in the manufacture of a binary optic may arise both from limitations of the pattern generator and from limitations inherent to the lithographic or etching process. The fabrication of a whole series of simple diffraction gratings patterned with a Mann device are used to determine jitter and systematic errors in the pattern generator. The diffraction behavior of the final optic is tested for deviations from perfection by comparing it to the diffraction calculated from an electromagnetic diffraction code.

© 1992 Optical Society of America