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Optimization of Quadralayer Structures for Various Magneto-Optical Recording Materials

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Abstract

Computer simulation of magneto-optical responses as a function of wavelength (300 - 800 nm), thicknesses, and material were made, based on the scattering matrix formulation for the calculation of optical and magneto-optical response of multilayer systems.1 Results from the following MO materials systems are presented: bismuth substituted garnets, TbFeCo, PtMnSb, and NiMnSb. Silicon nitride and silicon carbide were the dielectrics used in the simulations, and aluminum was assumed for the reflector. The optimum structure for each of these materials systems has been found. The Kerr rotation, ellipticity, reflectance, and figures of merit for recording were calculated.

© 1991 Optical Society of America

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