New Stigmatic XUV Plane Grating Devices

M. Pouey

doi:10.1364/OFT.1986.PD1

Workshop on Optical Fabrication and Testing
(Optica Publishing Group, 1986),
paper PD1
•https://doi.org/10.1364/OFT.1986.PD1

New Stigmatic XUV Plane Grating Devices

M. Pouey

Optical Fabrication and Testing 1986

Seattle, Washington United States
21–23 October 1986
ISBN:

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M. Pouey, "New Stigmatic XUV Plane Grating Devices," in Workshop on Optical Fabrication and Testing, (Optica Publishing Group, 1986), paper PD1.

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Abstract

To improve the resolution of grazing incidence XUV devices precise evaluation of the broadening parameters of the Line Spread Function are required. In this respect, transverse ray aberrations must be first evaluated for an oblique exit pupi¹-aperture stop not centered al the grating pole-geometrical optical criterion clearly shows then the competitive action of the defect of focus vs astigmatism and astigmatic coma.

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