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Conferences > OFT > 1996 > JThB > JThB.5

Phase Shifting Point Diffraction Interferometry of Lithographic Optics

Hector Medecki, David Attwood, Edita Tejnil, Kenneth A. Goldberg, Raul Beguiristain, and Jeffrey Bokor

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Abstract

The Center for X-Ray Optics is performing metrology of optics intended to be used for lithography at wavelengths in the Extreme Ultraviolet (EUV) range. The source for this radiation is an undulator operating at the Advanced Light Source (ALS). Initially a Point Diffraction Interferometer (PDI) was used and the experience acquired with this instrument led to the development of a new interferometer, the Phase Shifting Point Diffraction Interferometer (PSPDI), to be described in this paper.

© 1996 Optical Society of America

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