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Conferences > EUL > 1996 > OM > OM118

Phase-Shifting Point Diffraction Interferometry for At-Wavelength Testing of Lithographic Optics

E. Tejnil, K. A. Goldberg, H. Medecki, R. Beguiristain, J. Bokor, and D. T. Attwood

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Abstract

We report on the development of at-wavelength wavefront metrology for evaluation of extreme ultraviolet optics intended for use in projection lithography. Initially, a point diffraction interferometer was used and the experience acquired with this instrument led to the development of a new interferometer, the phase-shifting point diffraction interferometer. In this paper, point diffraction interferometry performed at EUV wavelengths is discussed. The design and implementation of the new phase-shifting point diffraction interferometer are described.

© 1996 Optical Society of America

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