Abstract

It is well known that ion-assisted deposition(IAD) has changed the optical, mechanical, and chemical properties of optical thin films. In a large chamber where ion beam should cover a large substrate area, a gridless ion source may be suitable because of its high ion current density, large divergence of ion beam, and low energy ion beam which leads to the low sputtering-out rate of growing films. Also, it is simple in fabrication, operation, and maintenance compared to a gridded ion source.

© 1992 Optical Society of America