Abstract

Thin film coating has found wide applications in optical systems. One of the main requirements an optical thin film must meet is its uniformity. To achieve the demanded uniformity, conventional efforts include special design of the vacuum chamber configuration [1], use of the masks [2], etc. Masks have also been utilized to coat non-uniform films [3]. In principle, a film of arbitrary thickness distribution can be made with an appropriate mask. Usually the shape, the size and the position of the mask are determined empirically. We presented a model to calculate the film thickness and/or the mask function.

© 1995 Optical Society of America