Abstract

A primary source of error in the layer thicknesses of electron-beam evaporated dielectric coatings is variation in the vapor plume. Using multiple crystal monitors mounted in different positions of the substrate plane can help to detect and understand these variations. Subsequently, material preparation and electron-beam sweep procedures can be developed to minimize these variations. In addition, layer thicknesses can be adjusted during the coating run to compensate for plume variations as they occur.

© 1995 Optical Society of America