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Conferences > OIC > 1995 > WB > WB9

Antireflection and high reflection coatings for excimer laser applications

V.V. Novopashin, E.A. Levchuk, G. Ya. Kolodgy, and V.S. Tyrin.

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Abstract

During the last years a grate interest arise to uv-lasers. This interest due to their applications in various fields of electronics and medicine. In this paper we present the results of fabricating dielectric films with high resistance to laser radiation at 193, 248, 266, 355 nm [1].

© 1995 Optical Society of America

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