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Sputter-Deposited Electrochromic Films of Tungsten Oxide: A Study of the Effects of Varying the Target-Substrate Distance

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Abstract

Electrochromic properties of transition metal oxides have been extensively studied in recent years due to their potential application as " smart " optical-switching window materials.1,2,3,4 In particular, tungsten oxide outperforms most of other transition metal oxide films and thus draws most attention from researchers.5 Tungsten oxide film can be prepared by many methods, including electron-beam evaporation, thermal vacuum evaporation,2 chemical vapor deposition, sol-gel deposition, and sputter deposition. Among these methods reactive sputtering is most suitable for large area applications such as automobile glass and architecture building glass.

© 1998 Optical Society of America

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