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Plasma ion-assisted deposition of TiO2 and MgF2 thin films

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Abstract

Optical and structural properties of TiO2 and MgF2 thin films deposited by plasma ion-assisted deposition were investigated and the effects of plasma ion-assistance and substrate heating were studied to deposit the stable TiO2/MgF2 multilayers.

© 2004 Optical Society of America

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