Post-fluorination of fluoride films for VUV lithography in order to improve their optical properties

Yusuke Taki; Shunji Watanabe; Akira Tanaka

doi:10.1364/OIC.2004.WF7

Optical Interference Coatings
OSA Technical Digest Series (Optica Publishing Group, 2004),
paper WF7
•https://doi.org/10.1364/OIC.2004.WF7

Post-fluorination of fluoride films for VUV lithography in order to improve their optical properties

Yusuke Taki, Shunji Watanabe, and Akira Tanaka

Optical Interference Coatings 2004

Tucson, Arizona United States
27 June–2 July 2004
ISBN: 3-5400-0364-9

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Short and Intense Wavelength Coatings (WF)

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Y. Taki, S. Watanabe, and A. Tanaka, "Post-fluorination of fluoride films for VUV lithography in order to improve their optical properties," in Optical Interference Coatings, OSA Technical Digest Series (Optica Publishing Group, 2004), paper WF7.

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Abstract

Post-fluorination process that consists of ‘fluorination of F-poor areas’ and ‘modification to denser structure’ has been developed. This process reduces the optical losses of fluoride films and prevents the losses from increasing with elapsed time.

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