Abstract
A model has been developed and validated for predicting film uniformity based on sputtering yield, angular distribution, mask shielding and film growth process in a multipass microwave/magnetron sputtering system using Niobium deposition on glass.
© 2016 Optical Society of America
PDF ArticleMore Like This
Chien-Jen Tang and Yi Chen
ThC.8 Optical Interference Coatings (OIC) 2022
Ana Lizbeth Villarreal Ríos, Álvaro Hernán Bedoya Calle, and Manuel García
TD.9 Optical Interference Coatings (OIC) 2016
Shigeng Song, Cheng Li, and Des Gibson
WB.8 Optical Interference Coatings (OIC) 2016