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Conferences > OIC > 2022 > ThC > ThC.8

Correction mask for large-area anti-reflection coatings deposited using a plasma-assisted reactive magnetron sputtering

Chien-Jen Tang and Yi Chen

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Abstract

Comparison of simulated and experimental correction-mask for high-uniformity anti-reflection coatings on large-area substrates deposited using a plasma-assisted reactive magnetron sputtering. A mask for optimizing film-thickness uniformity designed using a simulation program was less than ±1.3%.

© 2022 The Author(s)

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