Abstract

Thermal stress of optical thin film materials SiO2, HfO2, Al2O3, TiO2, and MgF2 exposed to laser pulse is simulated using 2D finite element method. Thermal stress is compressive and MgF2 film has the least value.

© 2019 The Author(s)

PDF Article
More Like This
Stress, microstructure and thermal-elastic properties of evaporated thin MgF2 – films

R. Thielsch, J. Heber, T. Feigl, and N. Kaiser
ThE6 Optical Interference Coatings (OIC) 2004

Mechanical stress, and thermal-elastic properties of oxide coatings for use in the DUV spectral region

R. Thielsch and N. Kaiser
ThB6 Optical Interference Coatings (OIC) 2001

Single-Shot Few-Cycle Pulse Laser-induced Damage and Ablation of HfO2/SiO2-based Optical Thin Films

Noah Talisa, Michael Tripepi, Brandon Harris, Abdallah AlShafey, Aaron Davenport, Emmett Randel, Carmen S. Menoni, and Enam Chowdhury
SM3H.2 CLEO: Science and Innovations (CLEO_SI) 2019

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription