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Finite Element Method Analyzes the Residual Stress of HfO2/SiO2 Multi-Layer on Flexible Substrate Evaporated with Ion-beam Assisted Deposition

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Abstract

The four-layer anti-reflection films of HfO2/SiO2 was prepared on flexible substrate by E-gun evaporation with ion-beam assisted deposition. Finite element method combined the shell theory to investigate the residual stress.

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