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Enabling rotary Atomic Layer Deposition for optical applications

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Abstract

Ta2O5 and SiO2 films coated by rotary atomic layer deposition were studied. Investigations proved low absorption 3.1 ppm, respectively 6.0 ppm as well as uniformity 1.55 % and 2.71 % for growth rates up to 0.18 nm/sec. (e-mail: l.kochanneck@lzh.de).

© 2022 The Author(s)

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