Abstract
Ta2O5 and SiO2 films coated by rotary atomic layer deposition were studied. Investigations proved low absorption 3.1 ppm, respectively 6.0 ppm as well as uniformity 1.55 % and 2.71 % for growth rates up to 0.18 nm/sec. (e-mail: l.kochanneck@lzh.de).
© 2022 The Author(s)
PDF Article | Presentation VideoMore Like This
Yuma Sugai, Toshihiko Sato, Hironori Sugata, Yohei Sakano, Satoshi Okuyama, Takuya Sugawara, Muhammad Safdar, Jani Hämäläinen, and Tommi Suni
TC.5 Optical Interference Coatings (OIC) 2022
Mikko Ritala and Markku Leskelä
MB1 Optical Interference Coatings (OIC) 2004
John Rönn, Mikko Konttinen, Kalle Niiranen, Mikael Saarniheimo, and Sami Sneck
TC.4 Optical Interference Coatings (OIC) 2022