Reduction of Nanoparticles in Optical Thin Films

Joshua McCauley; Marco Jupé; Marco Jupé; Jinlong Zhang; Jinlong Zhang; Jinlong Zhang; Andreas Wienke; Andreas Wienke; Detlev Ristau; Detlev Ristau

doi:10.1364/OIC.2022.WC.5

Optical Interference Coatings Conference (OIC) 2022
Technical Digest Series (Optica Publishing Group, 2022),
paper WC.5
•https://doi.org/10.1364/OIC.2022.WC.5

Reduction of Nanoparticles in Optical Thin Films

Joshua McCauley, Marco Jupé, Jinlong Zhang, Andreas Wienke, and Detlev Ristau

Optical Interference Coatings 2022

Whistler, British Columbia Canada
19–24 June 2022
ISBN: 978-1-957171-04-3

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PVD Methods: Technology Improvement and Optical Monitoring (WC)

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J. McCauley, M. Jupé, J. Zhang, A. Wienke, and D. Ristau, "Reduction of Nanoparticles in Optical Thin Films," in Optical Interference Coatings Conference (OIC) 2022, R. Sargent and A. Sytchkova, eds., Technical Digest Series (Optica Publishing Group, 2022), paper WC.5.

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Abstract

The paper presents a concept for the reduction of nanoparticles in optical thin films using ion etching, to remove nanoparticles present on the substrate, and to reduce the effects of particles introduced during deposition.

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