Optical Characteristics of Low-Refractive-Index Al2O3 Optical Thin Films Fabricated by Sputtering and Electron-Beam Vacuum Deposition

Hiroyasu Kato; Hiroshi Murotani; Takayuki Matsudaira

doi:10.1364/OIC.2022.WD.7

Optical Interference Coatings Conference (OIC) 2022
Technical Digest Series (Optica Publishing Group, 2022),
paper WD.7
•https://doi.org/10.1364/OIC.2022.WD.7

Optical Characteristics of Low-Refractive-Index Al₂O₃ Optical Thin Films Fabricated by Sputtering and Electron-Beam Vacuum Deposition

Hiroyasu Kato, Hiroshi Murotani, and Takayuki Matsudaira

Optical Interference Coatings 2022

Whistler, British Columbia Canada
19–24 June 2022
ISBN: 978-1-957171-04-3

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Deposition Technology Research for Non-Conventional Properties of Optical Coatings (WD)

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H. Kato, H. Murotani, and T. Matsudaira, "Optical Characteristics of Low-Refractive-Index Al2O3 Optical Thin Films Fabricated by Sputtering and Electron-Beam Vacuum Deposition," in Optical Interference Coatings Conference (OIC) 2022, R. Sargent and A. Sytchkova, eds., Technical Digest Series (Optica Publishing Group, 2022), paper WD.7.

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Abstract

Low-refractive-index Al₂O₃ optical thin films were prepared by simultaneous sputtering and electron-beam evaporation methods. This optical thin film also has practical mechanical properties and can withstand ultrasonic cleaning.

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