Abstract

Computer generated holograms (CGH) have many potential applications, such as holographic optical elements (HOE), pattern recognition, optical interconnect, and display of abstract objects[1-5]. In order to use these potentials to a full extent, a CGH must be recorded at very high resolution with precision on a large area. High resolution and large area require recording devices that have an extremely large space bandwidth product (SBWP). Electron beam lithography systems can satisfy these requirements. E-beam systems have a SBWP of order of 10¹⁰ and they are capable of direct writing patterns of submicron features with very high accuracy.

© 1987 Optical Society of America