Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Submicron-gap Photoconductive Switching in Silicon

Not Accessible

Your library or personal account may give you access

Abstract

The most common approach to increasing the speed of photoconductive switches has been to reduce the carrier lifetime, either by bombardment with high-energy ions [1] or by the use of disordered materials [2]. In either case, the material defects, which act as centers for recombination, may also reduce the free-carrier mobility before recombination and thus unnecessarily lower the sensitivity of the photoconductor. An alternative approach to increasing the speed of response is to sweep the photoinduced carriers out of the gap with the applied voltage in a time short compared to their lifetime [3]. Here we describe the application of this technique to photoconductive switching in high mobility silicon. With sub-micron photoconductive gaps and carrier sweep-out the response time has been reduced from 700 psec to 27 psec. Electrical pulses of more than 1 volt have been switched with optical pulse energies of less than a nanojoule.

© 1985 Optical Society of America

PDF Article
More Like This
Subpicosecond Response Times from Ion Bombarded InP

P. M. Downey
ThA6 Picosecond Electronics and Optoelectronics (UEO) 1985

Comparison of Oxygen Ion and Proton Implanted GaAs Photoconductive Switches

Sheng-lung L. Huang, Eve A. Chauchard, Chi H. Lee, Thane Smith, Timothy T. Lee, and Thomas R. Joseph
WE2 Picosecond Electronics and Optoelectronics (UEO) 1991

Photoconductive power switches

W. G. NUNNALLY, R. B. HAMMOND, and R. S. WAGNER
WM13 Conference on Lasers and Electro-Optics (CLEO:S&I) 1985

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.