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Fast Hologram Erasure in Photorefractive Materials

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Abstract

Real time holography in photorefractive materials has been considered for many applications, most recently to provide the reconfigurable interconnections in optical neural net computing.1 In these applications the existing holographic grating pattern must be erased and a new pattern written within the cycle time of the computer. The usual procedure for erasure is to flood the crystal with a separate erase beam or to use one of the write beams alone as the erase beam. We present a simple technique for rapid erasure by shifting the phase of one of the write beams by λ/2. This technique gives an almost complete erasure and is at least 8 times faster than using one of the write beams alone to erase.

© 1987 Optical Society of America

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