Abstract

In recent reports of the manufacture and characterization of small period multilayers, researchers have utilized high resolution TEM and an analysis of Cu-Kα X-Ray data to interpret and explain variations of reflectivity from theoretical predictions. These theoretical analyses are based on a dynamical reflectivity calculation which incorporates the Debye-Waller factor to simulate layer/interface roughness. Using the same analysis techniques we have evaluated how layer roughness varies with d-spacing and film thickness for small period (15Å<d<22Å) multilayers.

© 1992 Optical Society of America