Simulation of Mixing at Mo/Si Interfaces

D. B. Boercker; W. L. Morgan

doi:10.1364/PXRAYMS.1992.MD5

Physics of X-Ray Multilayer Structures
Technical Digest Series (Optica Publishing Group, 1992),
paper MD5
•https://doi.org/10.1364/PXRAYMS.1992.MD5

Simulation of Mixing at Mo/Si Interfaces

D. B. Boercker and W. L. Morgan

Physics of X-Ray Multilayer Structures 1992

Jackson Hole, Wyoming United States
2–5 March 1992
ISBN:

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Growth and Structure 2 (MD)

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D. B. Boercker and W. L. Morgan, "Simulation of Mixing at Mo/Si Interfaces," in Physics of X-Ray Multilayer Structures, Technical Digest Series (Optica Publishing Group, 1992), paper MD5.

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Abstract

Soft x-ray projection lithography is a rapidly emerging technology which will have enormous impact on the microelectronics industry, by providing faithful image reduction to a minimum feature size below 1000Å.¹ X-ray reduction cameras have already been designed and tested,²,³ but the successful development of this new technology will depend heavily upon the production of efficient, durable x-ray optics¹.

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