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Conferences > PXRAYMS > 1992 > PD > PD6

Limits to Ion Beam etching of Mo / Si multilayer coatings

R. Schlatmann, C. Lu, J. Verhoeven, E.J. Puik, and M.J. van der Wiel

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Abstract

Recently ion beam etching of electron beam deposited metal layers on C has resulted in higher x-ray reflection coefficients1. In spite of the widely recognized importance of Mo/Si multilayer coatings for projection lithography, little work has been done to use the etching technique on multilayer mirrors made of this combination of materials. As Mo/Si multilayer mirrors of d-values greater than 12 nm. have already been made with reflectivities very close to the theoretical maximum2, our main interest is in multilayers with smaller d-values.

© 1992 Optical Society of America

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