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Atomic Layer Epitaxy of Tungsten and Boron for Multilayer X-ray Optics

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Abstract

The demand for high quality multilayer x-ray optics (MXOs) has increased as x-ray imaging applications have developed. MXOs must be uniform and smooth with precise periods. The period of the MXO determines the angle and wavelength of the x-ray which can be reflected. Current preparation techniques are limited to a period of approximately 40 Å. To reflect harder x-rays at near normal incidence, smaller periods must be achieved.

© 1992 Optical Society of America

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