Abstract

Mo-based periodic multilayers such as Mo/Si and Mo/B₄C show great promise as reflectors for soft x-ray reduction lithography ^1-3). The thermal stability of multilayers is one of the most important factors for ensuring the reliable performance. The Mo/Si and Mo/B4C multilayers show high reflectivity in the 8 nm - 15 nm region at normal incidence. The purpose of this paper is to present the resulting changes of layered and crystal structures of the Mo/Si and Mo/B₄C multilayers upon thermal annealing.

© 1992 Optical Society of America