Abstract
Multilayer-based X-ray optical components call for structures made of smooth and uniform layers with an abrupt interface as well as a high thickness repeatability over many layers. A wide bandpass high energy x-ray reflector illustrates this extreme case where one needs an in-depth graded period multilayer with several hundreds of layers [1]. Thus, in situ characterization techniques are essential to detect thickness fluctuations and are moreover very helpful to optimize the layers. This is the purpose of the two different methods described: grazing X-ray reflectance and optical ellipsometry.
© 1994 Optical Society of America
PDF ArticleMore Like This
B. M. Clemens, J. A. Bain, B. M. Lairson, B. J. Daniels, A. P. Payne, N. M. Rensing, and S. Brennan
WC.1 Physics of X-Ray Multilayer Structures (PXRAYMS) 1994
E. Ziegler and D. Doublet
TuC.9 Physics of X-Ray Multilayer Structures (PXRAYMS) 1994
Mathias Schubert, Carsten Bundesmann, Nurdin Ashkenov, Eva Schubert, Horst Neumann, and Gerd Lippold
FB6 Optical Interference Coatings (OIC) 2004