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Application of in-situ ellipsometry to the study of ultrathinn layers and soft x-ray multilayers

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Abstract

Ellipsometry is an accurate tool to study surface and thin-film phenomena[1]. It gives information of the dielectric boundary structures causing diffractions or reflections at the probed area of a surface down to the escape depth of the probe light. With a He-Ne laser light of a wavelength of 633nm, the probed depth for most metals are of an order of a few tens nm, being equivalent to several periods of a soft x-ray multilayer The accuracy achieved for the single layers is at least a few tenths of nm in thickness[2,3].

© 1992 Optical Society of America

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