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Conferences > PXRAYMS > 1994 > MC > MC.6

Dependence of optimal deposition temperature of Mo/Si multilayer mirrors on the Mo/Si thickness ratio

E. Louis, H.-J. Voorma, N.B. Koster, F. Bijkerk, Yu. Ya. Platonov, G.E. van Dorssen, and H.A. Padmore

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Abstract

The increasing reflectivity of multilayer mirrors has made the use of reflective soft x-ray optical systems, e.g. in soft x-ray microscopy and soft x-ray projection lithography [1,2] possible. However, the use of multi-mirror systems [3] in industrial applications can only be successful if such a system has sufficient throughput. It is therefore necessary to optimize the reflectivity to the highest value possible.

© 1994 Optical Society of America

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