Abstract

Low pressure ion sputtering of certain materials utilizing Dual Ion Beam Assisted Deposition (DIBAD) techniques is known to produce high quality optical films.¹ This process makes use of ion beam sputtering at pressures much lower than those encountered, for example, in magnetron sputtering and simultaneously polishes the deposition with a second, low energy ion beam.^2,3,4,5 We have been using this method to produce diamond-like carbon films exhibiting high density, extreme hardness, high thermal conductivity, and uniform thickness over an area of 4.6 x 10³ mm².⁶ These characteristics stimulated us to investigate their use as the low electron density component of multilayer x-ray optical elements.

© 1994 Optical Society of America