MO-SI MULTILAYER AS SOFT X-RAY MIRRORS FOR THE WAVELENGTHS AROUND 20 NM REGION

D. Kim; H.W. Lee; J. J. Lee; J. H. Je; M. Sakurai; M. Watanabe

doi:10.1364/PXRAYMS.1994.MC.8

Physics of X-Ray Multilayer Structures
Technical Digest Series (Optica Publishing Group, 1994),
paper MC.8
•https://doi.org/10.1364/PXRAYMS.1994.MC.8

MO-SI MULTILAYER AS SOFT X-RAY MIRRORS FOR THE WAVELENGTHS AROUND 20 NM REGION

D. Kim, H.W. Lee, J. J. Lee, J. H. Je, M. Sakurai, and M. Watanabe

Physics of X-Ray Multilayer Structures 1994

Wyoming United States
14–17 March 1994
ISBN:

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Invited Review 1/Poster Session 1 (MC)

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D. Kim, H. W. Lee, J. J. Lee, J. H. Je, M. Sakurai, and M. Watanabe, "MO-SI MULTILAYER AS SOFT X-RAY MIRRORS FOR THE WAVELENGTHS AROUND 20 NM REGION," in Physics of X-Ray Multilayer Structures, Technical Digest Series (Optica Publishing Group, 1994), paper MC.8.

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Abstract

Molybdenum-silicon multilayer soft x-ray mirrors have been fabricated using a magnetron sputtering system. Their structures have been characterized by x-ray diffraction (XRD) and reflectivities at normal incidence have been measured by using monochromatized synchrotron radiation in the 18-24 nm region. A normal incidence reflectivity as high as 40% at 20.8 nm was achieved.

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