Sputtering Deposited Ta/Si Multilayer Soft X-Ray Mirrors

Shao Jianda; Fan Zhengxiu

doi:10.1364/PXRAYMS.1992.MC6

Physics of X-Ray Multilayer Structures
Technical Digest Series (Optica Publishing Group, 1992),
paper MC6
•https://doi.org/10.1364/PXRAYMS.1992.MC6

Sputtering Deposited Ta/Si Multilayer Soft X-Ray Mirrors

Shao Jianda and Fan Zhengxiu

Physics of X-Ray Multilayer Structures 1992

Jackson Hole, Wyoming United States
2–5 March 1992
ISBN:

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Poster Session (MC)

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S. Jianda and F. Zhengxiu, "Sputtering Deposited Ta/Si Multilayer Soft X-Ray Mirrors," in Physics of X-Ray Multilayer Structures, Technical Digest Series (Optica Publishing Group, 1992), paper MC6.

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Abstract

Tantalum/Silicon multilayers to be used as normal-incidence mirrors for 234A X-ray have been fabricated using plane magnetron sputtering system. The test and evaluation of characterizations have been given by Small Angle Diffraction with Cu-Ka radiation, Transmission Electron Microscopy and Auger Electron Spectrooscopy.

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