Abstract

The principle aim of polishing is to produce a specular reflective surface which is free of damage and artifacts. This is generally accomplished by three distinct polishing process: 1. Abrasive Polishing where abrasive particles are employed to abrade the surface 2. Chemical Polishing where dissolution of a surface is involved and is accomplished by chemical means. Semiconductors such as Ga As for example is polished using Bromine-Methanol as a chemical polishing medium. 3. Chemical Mechanical Polishing is a combination of the two process where a surface is oxidized by chemical means and then removed by abrasive action. Semiconductors and some metals are often polished using this method.

© 1984 Optical Society of America