Abstract

Recently, fine finishing of the materials such as semiconductor and ceramics has been needed exceedingly in the industries of electronics and precision machinary. A variety of polishing methods [1,2,3] have been hitherto developed, in such fields. A newly-developed polishing method is devised on the basis of the electro-magnetic behavior of the magnetic fluid, which has the ability to move in the magnetic field. This polishing method is named " Field-assisted Fine Finishing . The magnetic fluid is made with the suspension of fine magnetite Fe₃O₄ (<150 Å) into the liquid. It has been found from experiments that the new polishing method has the possibilities of flexible surface finishing and stock removal rate by varying the current to the electromagnet.

© 1984 Optical Society of America