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Electric Field-Assisted Fine Finishing Using Electrophoresis Phenomenon

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Abstract

Novel finishing method has been exceedingly required in the fields of electronics and precision machinary associated with the progress of technology. A variety of polishing methods [1,2,3] have been hitherto developed in such fields. A newly-developed polishing method is devised on the basis of the electrophoresis phenomenon of a grain in the liquid, which is able to move in the electric field. This polishing method is named " Field-assisted Fine Finishing ". It is found from the theoretical analysis that the moving mode of a grain has been influenced by the dielectric constant and the viscosity of the liquid, δ-potential and the supplied potential. It has been found from experiments that the new polishing method has possibilities of flexible surface finishing and the stock removal rate by varying the current or potential to the electrode.

© 1984 Optical Society of America

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