Laser-plasma sources for lithography

James M. Forsyth

doi:10.1364/SXRAY.1991.WB3

Soft-X-Ray Projection Lithography
Technical Digest Series (Optica Publishing Group, 1991),
paper WB3
•https://doi.org/10.1364/SXRAY.1991.WB3

Laser-plasma sources for lithography

James M. Forsyth

Soft X-Ray Projection Lithography 1991

Monterey, California United States
10–12 April 1991
ISBN:

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Soft-X-Ray Sources and Imaging (WB)

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J. M. Forsyth, "Laser-plasma sources for lithography," in Soft-X-Ray Projection Lithography, Technical Digest Series (Optica Publishing Group, 1991), paper WB3.

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Abstract

The characteristics of laser-plasma sources for lithographic applications in different spectral ranges will be reviewed, and the performance potential will be summarized.

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