Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Computational Simulations of a Soft X-Ray Projection Lithography Laser Plasma Source

Not Accessible

Your library or personal account may give you access

Abstract

A Sandia National Laboratories / AT&T Bell Laboratories team is developing a soft x-ray projection lithography tool that uses a compact laser plasma as a source of 14 nm x-rays. Optimization of the 14 nm x-ray source brightness is a key issue in this research. This paper describes our understanding of the source as it has been obtained through the use of computer simulations utilizing the LASNEX radiation-hydrodynamics code.

© 1993 Optical Society of America

PDF Article
More Like This
The Investigation of Discharge-laser-driven Plasmas as Sources for Soft X-ray Projection Lithography*

Paul D. Rockett, John A. Hunter, Richard E. Olson, William C. Sweatt, Glenn D. Kubiak, Kurt W. Berger, Randal L. Schmitt, Harry Shields, Michael Powers, and David L. Windt
WA.4 Soft X-Ray Projection Lithography (SXRAY) 1993

Soft X-ray Conversions Efficiencies from Laser-Produced Plasmas for Soft X-ray Projection Lithography Sources

R. C. Spitzer, R. L. Kauffman, T. Orzechowski, D. W. Phillion, and C. Cerjan
TuD.5 Soft X-Ray Projection Lithography (SXRAY) 1993

Laser Plasma Source Characterization for Soft X-ray Projection Lithography

William Silfvast, M.C. Richardson, H. Bender, A.M. Eigon, A. Hanzo, E. Miesak, and F. Jin
WA.2 Soft X-Ray Projection Lithography (SXRAY) 1993

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.