Abstract
A Sandia National Laboratories / AT&T Bell Laboratories team is developing a soft x-ray projection lithography tool that uses a compact laser plasma as a source of 14 nm x-rays. Optimization of the 14 nm x-ray source brightness is a key issue in this research. This paper describes our understanding of the source as it has been obtained through the use of computer simulations utilizing the LASNEX radiation-hydrodynamics code.
© 1993 Optical Society of America
PDF ArticleMore Like This
Paul D. Rockett, John A. Hunter, Richard E. Olson, William C. Sweatt, Glenn D. Kubiak, Kurt W. Berger, Randal L. Schmitt, Harry Shields, Michael Powers, and David L. Windt
WA.4 Soft X-Ray Projection Lithography (SXRAY) 1993
R. C. Spitzer, R. L. Kauffman, T. Orzechowski, D. W. Phillion, and C. Cerjan
TuD.5 Soft X-Ray Projection Lithography (SXRAY) 1993
William Silfvast, M.C. Richardson, H. Bender, A.M. Eigon, A. Hanzo, E. Miesak, and F. Jin
WA.2 Soft X-Ray Projection Lithography (SXRAY) 1993