Abstract

An instrumentation for total and angle-resolved scattering (ARS) at 193 and 157 nm has been developed at the Fraunhofer Institute in Jena to meet the severe requirements for scattering analysis of deep-and vacuum-ultraviolet optical components. Extremely low backscattering levels of 10⁻⁶ for the total scattering measurements and more than 9 orders of magnitude dynamic range for ARS have been accomplished. Examples of application extend from the control of at-wavelength scattering losses of superpolished substrates with rms roughness as small as 0.1 nm to the detection of volume material scattering and the study into the scattering of multilayer coatings. In addition, software programs were developed to model the roughness-induced light scattering of substrates and thin-film coatings.

© 2005 Optical Society of America

Light-scattering measurements of optical thin-film components at 157 and 193 nm

Stefan Gliech, Jörg Steinert, and Angela Duparré
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Surface assessment of CaF₂ deep-ultraviolet and vacuum-ultraviolet optical components by the quasi-Brewster angle technique

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Instrument for close-to-process light scatter measurements of thin film coatings and substrates

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