Abstract
An ion-assisted evaporation process is described for the formation of ITO films on substrates that cannot be heated beyond 150° C. Refractive indices and absorption coefficients were measured in the visible part of the spectrum for some of the films. The resistivity of the films varied between 0.7 and 8 × 10−3 Ω cm, depending on the process parameters. The properties were uniform over 25-cm diam areas.
© 1987 Optical Society of America
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