Add to BibSonomyAbstract
It is well known that particles on a silicon wafer may have a large influence on the yield of high - density devices. Such particles have been reliably detected only by light - scattering methods. Recently, light scattering has been used to attempt to measure the surface roughness of a silicon wafer, but reasonable results have not yet been obtained.
© 1992 Optical Society of America
PDF ArticleMore Like This
Light Scattering by Sub-Half Micron Spherical Particles on Silicon and Oxide/Silicon Surfaces*
E. J. Bawolek and E. D. Hirleman
PD3 Surface Roughness and Scattering (SURS) 1992
Regimes of Surface Roughness Measurable with Light Scattering
T.V. Vorburger, T.R. Lettieri, and Egon Marx
SMB3 Surface Roughness and Scattering (SURS) 1992
A Simplified Description of Light Scattered by an Optical Coating
Joseph H. Apfel
JWA1 Optical Interference Coatings (OIC) 1992