Abstract

MEMS has emerged as one of the most promising technologies for making optical switches and scanners. The surface-micromachining process is particularly attractive because its versatility and its resemblance to integrated circuit process. However, the micromirrors fabricated by the Standard polysilicon surface-micromachining process (e.g. Multi-User MEMS Process, or MUMPs™) exhibit significant curvature due to the residual stress of the thin films [1,2]. Moreover, surface topology is affected by structures undemeath the mirror. For most optical applications, flat micromirrors (roughness < λ/10) with large radius of curvature (> 30 cm) are required [3].

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