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  • The Pacific Rim Conference on Lasers and Electro-Optics
  • Technical Digest Series (Optica Publishing Group, 1995),
  • paper ThN4

Deposition of fluoropolymer thin films containing semiconductor microcrystallities by VUV laser ablation

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Abstract

Novel architectures combining organic and inorganic systems, which are especially aimed to form intelligent materials, have undergone significant development. Laser ablation methods with high power short wavelength lasers, which have been widely used to fabricate inorganic thin films, such as high-temperature ceramic superconductors, can also be used as a simple technique for organic thin film productions. We have already demonstrated that crystalline thin films of polytetrafluoroethylene (PTFE) were deposited on Si wafers by F2 laser (157 nm) ablation in 200 mTorr Ar gas atmosphere.1

© 1995 IEEE

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