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Pulsed laser deposition of high-Tc superconducting thin films for device applications

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Abstract

Pulsed laser assisted deposition (PLD) has recently emerged as a most promising film-growth technique, at least for basic research, as this has been best demonstrated for the case of superconducting compounds and YBa2Cu3O7–8 in particular. The field of applications of the PLD technique has rapidly spread, and to date, it already covers a broad spectrum of materials. One may anticipate that the PLD technique will soon give birth to a most competitive film-growth technology, in particular in the field of electronics, where it creates new opportunities.

© 1994 IEEE

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