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Conferences > CLEO_Europe > 2009 > CA5 > CA5_2
  • CLEO/Europe and EQEC 2009 Conference Digest
  • (Optica Publishing Group, 2009),
  • paper CA5_2

High Repetition and High Average Power Solid-State Laser for EUV Lithography

H. Fujita, K. Tsubakimoto, H. Yoshida, R. Bhushan, N. Miyanaga, and M. Nakatsuka

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Abstract

We have been developing a high repetition (5–100 kHz) and high average power (5 kW) Nd: YAG laser system for EUV lithography using laser produced plasma. Key subjects are (1) reliable front-end, (2) uniform and high density pumping of main amplifier rods, and (3) compensation of thermal effects.

© 2009 IEEE

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