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Conferences > COSI > 2023 > CM4B > CM4B.2

EUV diffractive imaging in reflection for wafer metrology using HHG source and automatic differentiation based ptychography

Sven Weerdenburg, Yifeng Shao, Roland Horsten, and Wim Coene

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Abstract

We report on a reflective ptychographic imaging system with an EUV high harmonic generation setup at 18 nm. Complex-valued multi-wavelength, multi-mode ptychographic reconstructions, utilizing automatic differentiation, of gold-titanium patterned samples can be demonstrated with 50-by-100 nanometers resolution.

© 2023 The Author(s)

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