Abstract

A three-element Köhler condenser system has been fabricated, characterized, and integrated into an EUV lithographic system. The multilayer coatings deposited on the optics were designed to provide optimal radiation transport efficiency and illumination uniformity. Extensive EUV characterization measurements performed on the individual optics and follow-on system measurements indicated that the condenser was operating close to design goals. Multilayer d-spacings were within 0.05 nm of specifications, and reflectances were approximately 60%. Illumination uniformity was better than ±10%. The broadband transport efficiency was 11%.

© 1994 Optical Society of America